应用 SiO 2 主要用作具有良好热机械性质的基质材料，可用于各种应用，包括：气相沉积、相沉积、原子力显微镜探针(AFM)、旋转涂覆、电子设备。 其他说明 其可能含有吸附的H 2 O和CO 2 ，这些组分可通过在>900°C下煅烧除去 Application SiO 2 is majorly used as a substrate material with excellent thermo-mechanical properties which can be used in a variety of applications which include: vapor deposition, phase deposition, atomic force microscopy probes(AFM), spin coating, electronic based devices. Other Notes May contain adsorbed H 2 O and CO 2 which is removable by calcining at >900°C